Published September 14, 2014 | Version v1
Journal article

Erratum: "Tunable photoluminescence of self-assembled GeSi quantum dots by B+ implantation and rapid thermal annealing" [J. Appl. Phys. 115, 233502 (2014)]

  • 1. National Key Laboratory for Surface Physics and Department of Physics, Fudan University, Shanghai 200433 (China)

Description

no abstract available

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
116
Journal Issue
10
Journal Page Range
p. 109902-109902.1
ISSN
0021-8979
CODEN
JAPIAU

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46012151
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
No Abstract
Descriptors DEI
ANNEALING; BORON IONS; GERMANIUM SILICIDES; ION IMPLANTATION; PHOTOLUMINESCENCE; QUANTUM DOTS
Descriptors DEC
CHARGED PARTICLES; EMISSION; GERMANIUM COMPOUNDS; HEAT TREATMENTS; IONS; LUMINESCENCE; NANOSTRUCTURES; PHOTON EMISSION; SILICIDES; SILICON COMPOUNDS

Optional Information

Notes
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