Published February 27, 2006 | Version v1
Journal article

Increased O(1D) metastable density in highly Ar-diluted oxygen plasmas

  • 1. Department of Electronics and Electrical Engineering, Keio University, Yokohama Kanagawa 223-8522 (Japan)
  • 2. Department of Electric and Electronic Engineering, National Defense Academy, Yokosuka Kanagawa 239-8686 (Japan)

Description

Enhancement of the growth rate of SiO2 with a rare gas diluted O2 plasma is of interest for application to various microelectronics fabrications. The key is the oxygen metastable atom (1D) density, which has the potential for surface activation. We used vacuum ultraviolet optical absorption spectroscopy to detect O(1D) and found a twofold increase in the density of O(1D) due to the dilution with Ar. The density increase is reasonably explained by the increase of the electron density, the oxygen dissociation fraction, and the Ar metastable density, that are experimentally obtained for low O2 fractions

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
88
Journal Issue
9
Journal Page Range
p. 091501-091501.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2006 American Institute of Physics