Published June 15, 1999
| Version v1
Report
Restricted
A High Resolution Sub-Micron Retarding Field Energy Analyzer for Low Temperature Plasma Analysis
Description
A retarding potential energy analyzer having 750 nm diameter, self-aligned grid apertures and micron scale grid separation has been fabricated using polycrystalline silicon and silicon dioxide. High resolution in situ measurements of ion velocity distributions have been demonstrated in inductively coupled argon plasmas. Measurement results agree well with those from a macroscopic analyzer. Important differences are observed in the energies of plasma ions when measured with respect to chamber wall versus those measured with respect to the plasma floating potential. Preliminary measurements under rf bias conditions have also been made and results follow the expected trends
Availability note (English)
Available from INIS in electronic form; ALSO AVAILABLE FROM OSTI AS DE00007865; NTIS; US GOVT. PRINTING OFFICE DEP.
Files
Additional details
Publishing Information
- Imprint Pagination
- 17 p.
- Series
- Applied Physics Letters
- Report number
- SAND--99-1509J
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 30053620
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- ELECTRIC POTENTIAL; ELECTROSTATIC ANALYZERS; PLASMA; SILICON; SILICON OXIDES
- Descriptors DEC
- BEAM ANALYZERS; CHALCOGENIDES; ELEMENTS; OXIDES; OXYGEN COMPOUNDS; SEMIMETALS; SILICON COMPOUNDS
Optional Information
- Contract/Grant/Project number
- Contract AC04-94AL85000
- Notes
- Preprint
- Funding organization
- USDOE (United States)