Published June 15, 1999 | Version v1
Report Restricted

A High Resolution Sub-Micron Retarding Field Energy Analyzer for Low Temperature Plasma Analysis

Description

A retarding potential energy analyzer having 750 nm diameter, self-aligned grid apertures and micron scale grid separation has been fabricated using polycrystalline silicon and silicon dioxide. High resolution in situ measurements of ion velocity distributions have been demonstrated in inductively coupled argon plasmas. Measurement results agree well with those from a macroscopic analyzer. Important differences are observed in the energies of plasma ions when measured with respect to chamber wall versus those measured with respect to the plasma floating potential. Preliminary measurements under rf bias conditions have also been made and results follow the expected trends

Availability note (English)

Available from INIS in electronic form; ALSO AVAILABLE FROM OSTI AS DE00007865; NTIS; US GOVT. PRINTING OFFICE DEP.

Files

Restricted

The record is publicly accessible, but files are restricted to users with access.

Additional details

Publishing Information

Imprint Pagination
17 p.
Series
Applied Physics Letters
Report number
SAND--99-1509J

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
30053620
Subject category
S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
Descriptors DEI
ELECTRIC POTENTIAL; ELECTROSTATIC ANALYZERS; PLASMA; SILICON; SILICON OXIDES
Descriptors DEC
BEAM ANALYZERS; CHALCOGENIDES; ELEMENTS; OXIDES; OXYGEN COMPOUNDS; SEMIMETALS; SILICON COMPOUNDS

Optional Information

Contract/Grant/Project number
Contract AC04-94AL85000
Notes
Preprint
Funding organization
USDOE (United States)