Published 1987 | Version v1
Book Metadata-only

Proceedings of the tenth international conference on chemical vapor deposition, 1987

Creators

Description

This book contains 121 papers. Some of the titles are: Thoretical modeling of the fluid mechanics and gas-phase chemistry in a rotating disk chemical vapor deposition reactor; The applicability of equilibrium calculations to dicholorosilane CVD; Kinetics of chemical vapor deposition of boron on molybdenum; and CVD processes in combustion turbines

Additional details

Publishing Information

Publisher
The Electrochemical Society.
Imprint Place
Pennington, NJ (USA)
Imprint Pagination
1261 p.

Conference

Title
10. international conference on chemical vapor deposition.
Dates
1 Oct 1987.
Place
Honolulu, HI (USA).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
19102272
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
BORON BROMIDES; CHEMICAL REACTION KINETICS; CHEMICAL VAPOR DEPOSITION; FEASIBILITY STUDIES; HIGH TEMPERATURE; HYDROGEN ADDITIONS; INTERNATIONAL COOPERATION; IRON; MEETINGS; PROCEEDINGS; SILANES; SILICON; THERMODYNAMICS; THIN FILMS
Descriptors DEC
BORON COMPOUNDS; BROMIDES; BROMINE COMPOUNDS; CHEMICAL COATING; COOPERATION; DEPOSITION; ELEMENTS; FILMS; HALIDES; HALOGEN COMPOUNDS; HYDRIDES; HYDROGEN COMPOUNDS; KINETICS; METALS; REACTION KINETICS; SEMIMETALS; SILICON COMPOUNDS; SURFACE COATING; TRANSITION ELEMENTS

Optional Information

Secondary number(s)
CONF-8710183--.