Mechanical and tribological properties of Ti-DLC films with different Ti content by magnetron sputtering technique
- 1. School of Petroleum Chemical Engineering, Lanzhou University of Technology, Lanzhou 730050 (China)
- 2. State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000 (China)
Description
Ti-doped diamond-like carbon (DLC) films were deposited on Si substrates at room temperature by magnetron sputtering Ti twin-target in methane and argon mixture atmosphere. The DLC films with different Ti concentrations were fabricated by varying the gas flow ratio of Ar/CH4. X-ray photoelectron spectroscopy (XPS), Raman spectra were used to analyze the composition and the microstructure of the films. The internal stress was calculated by using the Stoney equation, where the curvature of the film/substrate was measured by BGS 6341 type film stress tester. The mechanical and tribological properties of the films were systematically studied by the nano-indentor and reciprocating ball-on-disc tester, respectively. The Ti atomic concentration in the films increased from 0.41% to 8.2% as the Ar/CH4 flow ratio increased from 60/190 to 140/110. The Ti atoms exist mainly in the form of metallic-like Ti rather than TiC when Ti concentration is 0.41%, confirmed by XPS analysis. As the Ti concentration rose to 6.7%, the Ti-DLC films transformed to composite DLC films with carbide phase embedded in the DLC matrix because of the formation of TiC. As a result, the hardness is decreased, while the stress is dramatically increased. The Ti-DLC films with 0.41% Ti doping showed a relatively high hardness (13.75 GPa), low stress (0.56 GPa), extremely low wear rate (∼10-10 mm3/Nm) and low friction coefficient (0.05).
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2012.01.072Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2012.01.072;
- PII
- S0169-4332(12)00102-X;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 258
- Journal Issue
- 12
- Journal Page Range
- p. 5025-5030
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44030588
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ARGON; CARBON; DOPED MATERIALS; FILMS; FRICTION FACTOR; GAS FLOW; MAGNETRONS; MICROSTRUCTURE; PERFORMANCE; PRESSURE RANGE GIGA PA; RAMAN SPECTRA; RESIDUAL STRESSES; SPUTTERING; SUBSTRATES; TITANIUM ADDITIONS; TITANIUM CARBIDES; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- ALLOYS; CARBIDES; CARBON COMPOUNDS; DIMENSIONLESS NUMBERS; ELECTRON SPECTROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FLUID FLOW; FLUIDS; GASES; MATERIALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NONMETALS; PHOTOELECTRON SPECTROSCOPY; PRESSURE RANGE; RARE GASES; SPECTRA; SPECTROSCOPY; STRESSES; TITANIUM ALLOYS; TITANIUM COMPOUNDS; TRANSITION ELEMENT ALLOYS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.