Effects of nano calcium carbonate and siwak toothpaste on demineralized enamel surface roughness
Creators
- 1. Department of Dental Materials, Faculty of Dentistry, Universitas Indonesia, Jakarta 10430 (Indonesia)
Description
The aim of this study was to analyze the effect of nano calcium carbonate and Siwak toothpaste on demineralized enamel surface roughness. Human tooth specimens immersed in 0.3% citric acid at pH 3.25 were brushed with nano calcium carbonate and Siwak toothpaste for 2, 4, and 6 weeks. Enamel surface roughness was tested using a Surface Roughness Tester with supporting scanning electron microscopy and energy dispersive spectroscopy assessments. It was found the application of nano calcium carbonate and Siwak toothpaste for 2, 4, and 6 weeks decreased the surface roughness of the demineralized enamel (p < 0.05). Brushing teeth with nano calcium carbonate and Siwak toothpaste should decrease the surface roughness of demineralized enamel. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1742-6596/1073/3/032011Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. Conference Series (Online)
- Journal Volume
- 1073
- Journal Issue
- 3
- Journal Page Range
- [7 p.]
- ISSN
- 1742-6596
Conference
- Title
- 2. Physics and Technologies in Medicine and Dentistry Symposium
- Dates
- 18 Jul 2018
- Place
- Depok (Indonesia)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 53016349
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CALCIUM CARBONATES; CITRIC ACID; ENAMELS; PH VALUE; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPY; TEETH
- Descriptors DEC
- ALKALINE EARTH METAL COMPOUNDS; CALCIUM COMPOUNDS; CARBON COMPOUNDS; CARBONATES; CARBOXYLIC ACIDS; COATINGS; DIGESTIVE SYSTEM; ELECTRON MICROSCOPY; HYDROXY ACIDS; MICROSCOPY; ORAL CAVITY; ORGANIC ACIDS; ORGANIC COMPOUNDS; OXYGEN COMPOUNDS