Published May 2003 | Version v1
Journal article

Potassium ion implantation into glassy carbon

Description

Potassium ion implantation into glassy carbon (GC) was carried out to modify its surface to form a hydrophilic character. The ion implantation was performed using acceleration energies of 150 and 50 keV, with dosages between 1 x 1015 and 1 x 1017 ions/cm2. The wettability was evaluated from the contact angle of water on the substrates. For an acceleration energy of 150 keV, little change in the contact angle on the GC surface was observed. At an acceleration energy of 50 keV, the contact angle decreased with increasing K-ion dosage and decreased to zero at a dosage of 1 x 1017 ions/cm2. The distribution profiles of the K atoms were evaluated using Rutherford backscattering spectroscopy to investigate the properties of the hydrophilic surface. At an acceleration energy of 150 keV, the depth distribution of K atoms showed a Gaussian dependency. This profile is in a good agreement with a theoretical distribution calculated by the TRIM-98 code. At an acceleration energy of 50 keV, an additional peak appeared near the surface for an ion dosage of 5 x 1016 ions/cm2. The intensity of the two peaks increased and distribution widened at a dosage of 1 x 1017 ions/cm2. The decrease in contact angle can be explained by the distribution of the K atoms in the GC substrate

Additional details

Identifiers

PII
S0168583X03007298;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
206
Journal Issue
1-4
Journal Page Range
p. 211-214
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
13. international conference on ion beam modification of materials
Dates
1-6 Sep 2002
Place
Kobe (Japan)

INIS

Country of Publication
Netherlands
Country of Input or Organization
Egypt
INIS RN
35049435
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ACCELERATION; CARBON; GAUSSIAN PROCESSES; ION IMPLANTATION; KEV RANGE 10-100; KEV RANGE 100-1000; POTASSIUM IONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPATIAL DISTRIBUTION; WETTABILITY
Descriptors DEC
CHARGED PARTICLES; DISTRIBUTION; ELEMENTS; ENERGY RANGE; IONS; KEV RANGE; NONMETALS; SPECTROSCOPY

Optional Information

Copyright
Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.