Published June 30, 2003
| Version v1
Journal article
First-principles study for molecular beam epitaxial growth of GaN(0 0 0 1)
Creators
Description
Epitaxial growth of GaN(0 0 0 1) is possible even using molecular beam epitaxy (MBE). Under the N-rich condition, nitrogen adatom on GaN(0 0 0 1) truncated surface adsorbed at an abnormal site, H3-site which is not the original site for wurtzite structure nor zincblende structure. The nitrogen at the H3-site is very stable and inactive so that the epitaxial growth is prevented. The first-principles calculation shows us that the Ga-rich condition is very helpful to assist epitaxial growth of GaN(0 0 0 1)
Additional details
Identifiers
- DOI
- 10.1016/S0169-4332(03)00393-3;
- arXiv
- arXiv:hep-ph/9512274v2;
- PII
- S0169433203003933;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 216
- Journal Issue
- 1-4
- Journal Page Range
- p. 447-452
- ISSN
- 0169-4332
- CODEN
- ASUSEE
Conference
- Title
- 4. international symposium on the control of semiconductor interfaces
- Dates
- 21-25 Oct 2002
- Place
- Karuizawa (Japan)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38086778
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- GALLIUM NITRIDES; MOLECULAR BEAM EPITAXY; NITROGEN; SURFACES; VAPOR PHASE EPITAXY
- Descriptors DEC
- CRYSTAL GROWTH METHODS; ELEMENTS; EPITAXY; GALLIUM COMPOUNDS; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES
Optional Information
- Copyright
- Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.