Published June 30, 2003 | Version v1
Journal article

First-principles study for molecular beam epitaxial growth of GaN(0 0 0 1)

Creators

Description

Epitaxial growth of GaN(0 0 0 1) is possible even using molecular beam epitaxy (MBE). Under the N-rich condition, nitrogen adatom on GaN(0 0 0 1) truncated surface adsorbed at an abnormal site, H3-site which is not the original site for wurtzite structure nor zincblende structure. The nitrogen at the H3-site is very stable and inactive so that the epitaxial growth is prevented. The first-principles calculation shows us that the Ga-rich condition is very helpful to assist epitaxial growth of GaN(0 0 0 1)

Additional details

Identifiers

DOI
10.1016/S0169-4332(03)00393-3;
arXiv
arXiv:hep-ph/9512274v2;
PII
S0169433203003933;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
216
Journal Issue
1-4
Journal Page Range
p. 447-452
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
4. international symposium on the control of semiconductor interfaces
Dates
21-25 Oct 2002
Place
Karuizawa (Japan)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38086778
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
GALLIUM NITRIDES; MOLECULAR BEAM EPITAXY; NITROGEN; SURFACES; VAPOR PHASE EPITAXY
Descriptors DEC
CRYSTAL GROWTH METHODS; ELEMENTS; EPITAXY; GALLIUM COMPOUNDS; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES

Optional Information

Copyright
Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.