Published February 15, 2010 | Version v1
Journal article

Swift-heavy-ion-induced damage formation in III-V binary and ternary semiconductors

  • 1. Department of Electronic Materials Engineering, Research School of Physics and Engineering, Australian National University, Canberra, Australian Capital Territory 0200 (Australia)
  • 2. Australian Synchrotron, Clayton, Victoria 3168 (Australia)
  • 3. Department of Nuclear Physics, Research School of Physics and Engineering, Australian National University, Canberra, Australian Capital Territory 0200 (Australia)

Description

Damage formation in InP, GaP, InAs, GaAs, and the related ternary alloys Ga0.50In0.50P and Ga0.47In0.53As irradiated at room temperature with 185 MeV Au ions was studied using Rutherford backscattering spectroscopy in channeling configuration, transmission electron microscopy, and small-angle x-ray scattering. Despite nearly identical ion-energy loss in these materials, their behavior under swift-heavy-ion irradiation is strikingly different: InP and Ga0.50In0.50P are readily amorphized, GaP and GaAs remain almost undamaged and InAs and Ga0.47In0.53As exhibit intermediate behavior. A material-dependent combination of irradiation-induced damage formation and annealing is proposed to describe the different responses of the III-V materials to electronic energy loss.

Additional details

Identifiers

Publishing Information

Journal Title
Physical Review. B, Condensed Matter and Materials Physics
Journal Volume
81
Journal Issue
7
Journal Page Range
p. 075201-075201.9
ISSN
1098-0121

Optional Information

Notes
(c) 2010 The American Physical Society