Published 1998 | Version v1
Journal article

Rf sputtered TiO2 thin films modified by WO3

  • 1. Department of Inorganic Chemistry, University of Mining and Metallurgy, Cracow (Poland)
  • 2. Institute of Electronics, University of Mining and Metallurgy, Cracow (Poland)

Description

TiO2 thin films modified by WO3 were deposited by rf reactive sputtering from Ti-W metallic target. Tungsten content, W/(Ti+W) in TiO2-WO3 thin films varied from 0 to 0.5. Anatase polymorphic form was obtained in films with relatively high tungsten atomic ratio. The optical transmission spectra of as-sputtered and annealed samples confirmed the transformation from amorphous to polycrystalline state. High level of diffused transmission (10%) in the vicinity of the fundamental absorption edge was observed for annealed samples. (author)

Additional details

Publishing Information

Journal Title
Inzynieria Materialowa
Journal Volume
19
Journal Issue
4
Journal Page Range
p. 856-859
ISSN
0208-6247

Conference

Title
15. Physical Metallurgy and Materials Science Conference on Advanced Materials and Technology (AMT'98)
Dates
17-21 May 1998
Place
Cracow - Krynica (Poland)

Optional Information

Contract/Grant/Project number
AGH proj. 10.160.476
Notes
7 refs, 5 figs