Published August 23, 1972
| Version v1
Patent
Technique for controlling the exposure of a sample to an ion beam
Description
no abstract available
Availability note (English)
Available from INPI, Paris.Additional details
Additional titles
- Original title (French)
- Procede pour regler l'exposition d'un echantillon a un faisceau d'ions
Publishing Information
- Imprint Pagination
- 8 p.
- IPC:
- Int. Cl. G01n23/00; H01l7/00; H05h7/00.
- IPC
- Int. Cl. G01n23/00; H01l7/00; H05h7/00.
- Patent number
- FR patent document 2151361/D/
INIS
- Country of Publication
- France
- Country of Input or Organization
- France
- INIS RN
- 5110368
- Subject category
- S43: PARTICLE ACCELERATORS;
- Resource subtype / Literary indicator
- Non-conventional Literature
- Descriptors DEI
- CONTROL EQUIPMENT; ION BEAMS; IRRADIATION DEVICES; RADIATION DOSES
- Descriptors DEC
- BEAMS
Optional Information
- Notes
- Available from Institut National de la Propriete Industrielle, Paris (France) Priority claim: 24/08/71.