Optical and microstructural properties of nanocomposite Au/SiO2 films containing particles deformed by heavy ion irradiation
- 1. Department of Engineering Physics, Ecole Polytechnique de Montreal, CP 6079, succ. Centre-Ville, Montreal, Quebec, H3C 3A7 (Canada)
- 2. Physics Department, Universite de Montreal, CP 6128, succ. Centre-Ville, Montreal, Quebec, H3C 3J7 (Canada)
Description
Gold nanoparticles embedded in a dielectric matrix (SiO2) were prepared by a hybrid technique combining plasma-enhanced chemical vapor deposition and pulsed DC sputtering. The concentration and spatial distribution of the metal particles were controlled by deposition parameters, while particle size and size distribution were further adjusted by annealing. Subsequently, the nanocomposite samples were exposed to an energetic ion beam (30 MeV), a treatment that has been shown to transform spherical particles to high aspect ratio ellipsoids. The films were studied in detail by spectroscopic ellipsometry and spectrophotometry, and their optical response was correlated with their microstructural features such as particle alignment in the ion beam direction, as documented by the blue shift of the surface plasmon resonance (SPR). We show that such process is reversible in a sense that subsequent annealing of ion beam-irradiated particles red shifts the SPR to the initial position
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2004.11.180;
- PII
- S0040-6090(04)01774-2;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 479
- Journal Issue
- 1-2
- Journal Page Range
- p. 232-237
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37019453
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; ELLIPSOMETRY; GOLD; GOLD IONS; HEAVY IONS; ION BEAMS; IRRADIATION; MEV RANGE 10-100; NANOSTRUCTURES; PLASMA; SILICON OXIDES; SPECTROPHOTOMETRY; SPUTTERING; THIN FILMS
- Descriptors DEC
- BEAMS; CHALCOGENIDES; CHARGED PARTICLES; CHEMICAL COATING; DEPOSITION; ELEMENTS; ENERGY RANGE; FILMS; HEAT TREATMENTS; IONS; MATERIALS; MEASURING METHODS; METALS; MEV RANGE; OXIDES; OXYGEN COMPOUNDS; SILICON COMPOUNDS; SURFACE COATING; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.