Published 1995 | Version v1
Miscellaneous

Application of SIMS spectrometer in low-energy ion implantation studies

  • 1. Uniwersytet Marii Curie-Sklodowskiej, Lublin (Poland). Inst. Fizyki

Description

Short communication

Part of:
Abstracts of 3. Seminar Surface and Thin Layer Structures subject

Additional details

Additional titles

Original title (Polish)
Zastosowanie spektrometru SIMS w badaniach niskoenergetycznej implantacji jonowej

Publishing Information

Publisher
Instytut Technologii Elektronowej.
Imprint Place
Warsaw (Poland)
Imprint Title
Abstracts of 3. Seminar Surface and Thin Layer Structures
Imprint Pagination
116 p.
Journal Page Range
p. 72.

Conference

Title
3. Seminar on Surface and Thin Layer Structures.
Original Conference Title
3. Seminarium Powierzchnia i Struktury Powierzchniowe
Dates
23-26 Oct 1995.
Place
Spala (Poland).

INIS

Country of Publication
Poland
Country of Input or Organization
Poland
INIS RN
28080352
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference, No Abstract, Non-conventional Literature
Descriptors DEI
CESIUM IONS; ION BEAMS; ION IMPLANTATION; MASS SPECTROMETERS; MEETINGS
Descriptors DEC
BEAMS; CHARGED PARTICLES; IONS; MEASURING INSTRUMENTS; SPECTROMETERS

Optional Information

Notes
Imprint:3. Seminarium Powierzchnia i Struktury Cienkowarstwowe. Streszczenia.