Published September 16, 1993 | Version v1
Journal article

Cubic boron nitride films formed by DC plasma CVD

  • 1. Dept. of Physics, Lanzhou Univ. (China)

Description

In our present work, cBN films were deposited on Si wafers by dc plasma CVD. Experimental results have shown a high growth rate, and the obtained films consisted of almost single cBN under some deposition conditions. (orig.)

Additional details

Publishing Information

Journal Title
Physica Status Solidi. A, Applied Research
Journal Volume
139
Journal Issue
1
Journal Page Range
p. K25-K28.
ISSN
0031-8965
CODEN
PSSABA

INIS

Country of Publication
Germany
Country of Input or Organization
Germany
INIS RN
25021390
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
BORON NITRIDES; CUBIC LATTICES; DEPOSITION; FILM CONDENSATION; THIN FILMS
Descriptors DEC
BORON COMPOUNDS; CRYSTAL LATTICES; CRYSTAL STRUCTURE; FILMS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; VAPOR CONDENSATION