Published March 2016 | Version v1
Journal article

Tuning nitrogen species to control the charge carrier concentration in highly doped graphene

  • 1. Chemistry of Interaction Plasma Surface (ChIPS), University of Mons (Belgium)
  • 2. Laboratory for Chemistry of Novel Materials, University of Mons (Belgium)
  • 3. Research Group on Carbon Nanostructures (CARBONNAGe), University of Namur (Belgium)
  • 4. Elettra Sincrotrone Trieste, Strada Statale 14 km 163.5, 34149 Trieste (Italy)

Description

Highly nitrogen-doped graphene on copper has been obtained by post-synthesis low-energy ion implantation. Core level and angle resolved photoemission spectroscopies are correlated to link the actual charge carrier doping to the different nitrogen species implanted in the nanostructure. Indeed, we exploit the possibility of controlling the graphitic/pyridinic ratio through thermal heating to tune the charge carrier density; this implicates Dirac cone shifts that are directly correlated to the different doping contribution of the nitrogen species. Supported by density functional theory calculations, we identify graphitic nitrogen as being responsible for n-doping when the amount of counterbalancing pyridinic nitrogen species is reduced upon thermal heating. (letter)

Availability note (English)

Available from http://dx.doi.org/10.1088/2053-1583/3/1/011001

Additional details

Identifiers

Publishing Information

Journal Title
2D Materials
Journal Volume
3
Journal Issue
1
Journal Page Range
[8 p.]
ISSN
2053-1583