Published 1993 | Version v1
Journal article

Micro PIXE analysis using an X-ray from incident ions

  • 1. Osaka National Research Inst., AIST, Ikeda (Japan)

Description

A possibility of using an X-ray from incident ions in micro PIXE measurement with MeV heavy ions was discussed. To reveal the feature, a Cu-Ti plate was analyzed by a 5 MeV silicon and a 5 MeV nickel ion microprobe and the PIXE-mapping images of the X-rays from the incident ions were compared with the normal PIXE-mapping images of the X-rays from the target. These images indirectly reflected the distribution of a specific element with good statistics. (author)

Additional details

Publishing Information

Journal Title
International Journal of PIXE
Journal Volume
3
Journal Issue
4
Journal Page Range
p. 307-312.
ISSN
0129-0835
CODEN
IJPXET