Kinetic features of growth of interferometrically coloured oxide films on zirconium in air, water vapor and carbon dioxide atmospheres

The process of zirconium oxidation in the temperature range of 350-650 deg C in air, water vapour and carbon dioxide has been studied for the first time using the method of interference indication. It is determined that a complex process corresponding to the simultaneous building-up of oxide film and oxygen dissolving in the matrix through its diffusion in the depth of metal proceeds at the temperature above 450 deg C. Differential layer-by-layer determination of the energy of zirconium oxidation process activation has been realized using the method of interference indication