Theoretical ion implantation profiles for low energy protons under channeling conditions
Creators
- 1. Univ. of Florida, Gainesville, FL (United States)
Description
The authors present early results from the CHANNEL code, which simulates the passage of ionized projectiles through bulk solids. CHANNEL solves the classical equations of motion for the projectile using a force obtained from the gradient of the quantum mechanically derived coulombic potential of the solid (determined via a full potential augmented plane wave (FLAPW) calculation on the bulk) and a quantum mechanical energy dissipation term, the stopping power, as determined from the method of Echenique, Neiminen, and Ritchie. The code then generates the trajectory of the ionic projectile for a given incident position on the unit cell face and an initial velocity. The authors use CHANNEL to generate an ion (proton) implantation profile for the test case of simple cubic hydrogen with the projectile's initial velocity parallel to the (100) channel. Further preliminary results for ion implantation profiles of protons in diamond structure Si, with initial velocity along the (100) and (110) channels, are given
Additional details
Publishing Information
- Publisher
- John Wiley and Sons, Inc.
- Imprint Place
- New York, NY (United States)
- Imprint Title
- Proceedings of the international symposium on atomic, molecular and condensed matter theory and computational methods
- Imprint Pagination
- 714 p.
- Journal Page Range
- p. 283-297.
Conference
- Title
- Atomic, molecular, and condensed matter theory and computational methods.
- Dates
- 12-19 Feb 1994.
- Place
- Ponte Vedra Beach, FL (United States).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 27018493
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COLLISIONS; COMPUTER CODES; COULOMB SCATTERING; ION CHANNELING; ION IMPLANTATION; MATHEMATICAL MODELS; MILLER INDICES; PROTONS; QUANTUM MECHANICS; SILICON; TRAJECTORIES
- Descriptors DEC
- BARYONS; BASIC INTERACTIONS; CATIONS; CHANNELING; CHARGED PARTICLES; ELASTIC SCATTERING; ELECTROMAGNETIC INTERACTIONS; ELEMENTARY PARTICLES; ELEMENTS; FERMIONS; HADRONS; HYDROGEN IONS; HYDROGEN IONS 1 PLUS; INTERACTIONS; IONS; MECHANICS; NUCLEONS; SCATTERING; SEMIMETALS
Optional Information
- Secondary number(s)
- CONF-9402143--.