Published January 28, 2014
| Version v1
Journal article
Structural and dielectric properties of Ba0.7Sr0.3TiO3 thin films grown by PLD
Creators
- 1. Nanophotonic and Optoelectronic Devices Laboratory, Department of Physics, Cochin University of Science and Technology, Kerala (India)
Description
Ferroelectric thin films of Ba0.7Sr0.3TiO3 (BST) were deposited on Si/SiO2/TiO2/Pt (PtSi) substrate by pulsed laser deposition (PLD). Crystalline films with perovskite structure were obtained without post-deposition annealing. Phase purity of the deposited films was confirmed by x-ray diffraction. The lowest value of FWHM obtained for the film deposited at oxygen pressure 5.4×10−4 mbar and substrate temperature 600°C, indicates the high crystallinity of the film. The room temperature dielectric constant at 100 kHz was 85. Butterfly loop, which is the characteristic of ferroelectric materials, was obtained in the regime of −4 to +4V. The leakage current density was nearly 9×10−13 Acm−2
Additional details
Identifiers
- DOI
- 10.1063/1.4862023;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 1576
- Journal Issue
- 1
- Journal Page Range
- p. 212-214
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- 2. international conference on optoelectronic materials and thin films for advanced technology
- Acronym
- OMTAT 2013
- Dates
- 3-5 Jan 2013
- Place
- Kochi, Kerala (India)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45085245
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANNEALING; DENSITY; DEPOSITS; ENERGY BEAM DEPOSITION; FERROELECTRIC MATERIALS; LASER RADIATION; LEAKAGE CURRENT; OXYGEN; PERMITTIVITY; PEROVSKITE; PULSED IRRADIATION; SILICA; SILICON OXIDES; SUBSTRATES; THIN FILMS; TITANIUM OXIDES; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; COHERENT SCATTERING; CURRENTS; DEPOSITION; DIELECTRIC MATERIALS; DIELECTRIC PROPERTIES; DIFFRACTION; ELECTRIC CURRENTS; ELECTRICAL PROPERTIES; ELECTROMAGNETIC RADIATION; ELEMENTS; FILMS; HEAT TREATMENTS; IRRADIATION; MATERIALS; MINERALS; NONMETALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PEROVSKITES; PHYSICAL PROPERTIES; RADIATIONS; SCATTERING; SILICON COMPOUNDS; SURFACE COATING; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- (c) 2014 AIP Publishing LLC