Published May 2009 | Version v1
Journal article

In situ positioning of a few hundred micrometer-sized cleaved surfaces for soft-x-ray angle-resolved photoemission spectroscopy by use of an optical microscope

  • 1. Japan Synchrotron Radiation Research Institute (JASRI), 1-1-1 Kouto, Sayo, Hyogo 679-5198 (Japan)
  • 2. Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531 (Japan)
  • 3. The Graduate School of Natural Science and Technology, Okayama University, 3-1-1 Tsushima-naka, Okayama 700-8530 (Japan)

Description

A method to position samples with small cleaved regions has been developed to be applied to the angle-resolved photoemission spectroscopy (ARPES) which uses soft-x-ray synchrotron radiation focused down to 160x180 μm2. A long-working-distance optical microscope is used for the sample observation. A selected region on a sample can be optimally set at the position of measurements, which is realized by the spatial resolution of the photoelectron analyzer. Using this method, electronic band dispersions of bulk silicon have been measured by ARPES for a partially cleaved region with a size of ∼200x500 μm2.

Additional details

Identifiers

Publishing Information

Journal Title
Review of Scientific Instruments
Journal Volume
80
Journal Issue
5
Journal Page Range
p. 053901-053901.4
ISSN
0034-6748
CODEN
RSINAK

Optional Information

Notes
(c) 2009 American Institute of Physics