Facet coatings for nonhermetically packaged lasers
Creators
- 1. Bookham Technology, 3500 Carling Avenue, Ottawa, Ontario K2H 8E9 (Canada)
- 2. Nortel Networks, 3500 Carling Avenue, Ottawa, Ontario K2H 8E9 (Canada)
Description
Nonhermetic packaging is one avenue of reducing the module cost of optical devices; however, this requires the coatings applied to the facets of lasers and modulators to be highly stable and impervious to the effects of high humidity under high temperature/high power operating conditions. We have developed two types of facet coatings for nonhermetic applications. One involves electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) of a SiNx cap layer and the other utilizes ion beam deposition (IBD) of a Ta2O5 cap layer, both on top of a two-layer SiO2/a-Si high-reflectance (HR) coating deposited on the facets of Fabry-Perot (F-P) ridge waveguide (RWG) lasers operating at 1310 nm. The lasers were aged under 85 deg. C/85% relative humidity (RH) conditions and ex situ tested using drive currents of 10-20 mA (subthreshold) and 80-120 mA operating currents (Iop). The output power-current-voltage (L-I-V) tests were conducted at room temperature and at various time intervals up to 5000 h. For comparison, tests were also done on devices aged in a dry oven
Additional details
Identifiers
- DOI
- 10.1116/1.1647585;
Publishing Information
- Journal Title
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
- Journal Volume
- 22
- Journal Issue
- 3
- Journal Page Range
- p. 865-869
- ISSN
- 0734-2101
- CODEN
- JVTAD6
Conference
- Title
- 11. Canadian semiconductor technology conference
- Dates
- 18-22 Aug 2003
- Place
- Ottawa (Canada)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36028205
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; COATINGS; CURRENTS; ELECTRON CYCLOTRON-RESONANCE; HUMIDITY; ION BEAMS; LASERS; OPTICAL EQUIPMENT; PLASMA; SILICON OXIDES; TANTALUM OXIDES; TEMPERATURE RANGE 0273-0400 K; TEMPERATURE RANGE 0400-1000 K; WAVEGUIDES
- Descriptors DEC
- BEAMS; CHALCOGENIDES; CHEMICAL COATING; CYCLOTRON RESONANCE; DEPOSITION; EQUIPMENT; MOISTURE; OXIDES; OXYGEN COMPOUNDS; REFRACTORY METAL COMPOUNDS; RESONANCE; SILICON COMPOUNDS; SURFACE COATING; TANTALUM COMPOUNDS; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- (c) 2004 American Vacuum Society.