Published December 1993 | Version v1
Journal article Metadata-only

Study of psedo-alloy titanium-tungsten film deposition by co-sputtering

Creators

  • 1. AN SSSR, Chernogolovka (Russian Federation). Inst. Fiziki Tverdogo Tela

Description

The film deposition by magnetron sputtering of titanium and tungsten has been investigated. It is found that the electric resistivity depends on the titanium-to-tungsten ratio in the deposited film. Auger-spectrometric studies of the films obtained by sputtering of powder targets and co-sputtering have been shown that the films from powder targets are appreciably contaminated compared with films from metallic targets

Additional details

Additional titles

Original title (Russian)
Исследование процесса нанесения пленок псевдосплава титан–вольфрам совместным распылением

Publishing Information

Journal Title
Poverkhnost': Fizika, Khimiya, Mekhanika
Journal Issue
no.12
Journal Page Range
p. 61-64.
ISSN
0207-3528
CODEN
PFKMDJ

INIS

Country of Publication
Russian Federation
Country of Input or Organization
Russian Federation
INIS RN
25051203
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
BINARY ALLOY SYSTEMS; CONCENTRATION RATIO; DEPOSITION; ELECTRIC CONDUCTIVITY; FILMS; MAGNETRONS; SPUTTERING; TITANIUM ALLOYS; TUNGSTEN ALLOYS
Descriptors DEC
ALLOY SYSTEMS; ALLOYS; ELECTRICAL PROPERTIES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; MICROWAVE EQUIPMENT; MICROWAVE TUBES; PHYSICAL PROPERTIES