Published 1987 | Version v1
Journal article

Influence of ion bombardment in argon on the structure of aluminium thin films

Description

Change of the structure of aluminium condensates of up to 1 μm thickness due to argon ion bombardment on the cathode of glow discharge was studied by the illuminating electron diffractometry. Increase of lattice of parameter broadening of diffraction maxima and anomalous incoherent electron scattering after the film bombardment with argon ions has been discovered. The interaction mechanism of discharge ions and a metal film is discussed depending on the discharge parameters

Additional details

Additional titles

Original title (Russian)
Влияние ионной бомбардировки в аргоне на структуру тонких пленок алюминия

Publishing Information

Journal Title
Ehlektron. Obrab. Mater.
Journal Issue
no.1
Series
Ehlektron. Obrab. Mater.
ISSN
0013-5739
CODEN
EOBMA

Optional Information

Notes
For English translation see the journal Electrochemistry in Industrial Processing and Biology (USA).