Published October 31, 2017 | Version v1
Journal article

Enhanced photo-catalytic activity of TiO2 films by removal of surface carbon impurities; the role of water vapor

  • 1. Department of Chemistry and Energy Engineering, Sangmyung University, Seoul 03016 (Korea, Republic of)
  • 2. Department of Chemistry, Sungkyunkwan University, Suwon 16419 (Korea, Republic of)
  • 3. Mass Spectrometry & Advanced Instrument Group, Korea Basic Science Institute, Ochang Center, Chungbuk 28119 (Korea, Republic of)

Description

Highlights: • Changes of TiO2 surfaces during photo-catalysis were studied by XPS. • Role of humidity for photo-catalytic decomposition of acetaldehyde was studied. • Competitive adsorption of water and acetaldehyde resulted in the reduction of reaction rate. • Water vapor facilitated the photo-catalytic removal of carbon impurities from TiO2. - Abstract: We have studied the photo-catalytic degradation of acetaldehyde over the surface of TiO2 films under UV light (365 nm) irradiation both at dry and humid air conditions using a high vacuum chamber equipped with on-line gas-chromatography as a batch-type reactor. Changes of TiO2 surfaces upon the photo-catalysis experiments were studied by X-ray photoelectron spectroscopy. The competitive adsorption of water and acetaldehyde resulted in the reduction of reaction rate of photo-catalytic degradation of acetaldehyde under the UV light irradiation. The photo-catalytic reaction rate of TiO2 films towards acetaldehyde mineralization increased when the photo-catalysis experiments were performed repeatedly and it was much more pronounced under humid conditions. Our XPS analysis revealed that carbon impurities on the surface of TiO2 films were removed by UV-light driven photo-catalytic mineralization under humid conditions. Water vapor facilitated the photo-catalytic removal of carbon impurities from TiO2 surface generating additional active sites of TiO2 which resulted in the enhanced photo-catalytic activity of TiO2 films.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2017.05.223

Additional details

Identifiers

DOI
10.1016/j.apsusc.2017.05.223;
PII
S0169-4332(17)31578-7;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
420
Journal Page Range
p. 808-816
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.