Thickness-dependent surface plasmon resonance of ITO nanoparticles for ITO/In-Sn bilayer structure
- 1. Engineering Research Center of Optical Instruments and Systems, Ministry of Education and Shanghai Key Lab of Modern Optical Systems, University of Shanghai for Science and Technology, No. 516 Jungong Road, Shanghai 200093 (China)
Description
Tuning the localized surface plasmon resonance (LSPR) in doped semiconductor nanoparticles (NPs), which represents an important characteristic in LSPR sensor applications, still remains a challenge. Here, indium tin oxide/indium tin alloy (ITO/In-Sn) bilayer films were deposited by electron beam evaporation and the properties, such as the LSPR and surface morphology, were investigated by UV–VIS–NIR double beam spectrophotometer and atomic force microscopy (AFM), respectively. By simply engineering the thickness of ITO/In-Sn NPs without any microstructure fabrications, the LSPR wavelength of ITO NPs can be tuned by a large amount from 858 to 1758 nm. AFM images show that the strong LSPR of ITO NPs is closely related to the enhanced coupling between ITO and In-Sn NPs. Blue shifts of ITO LSPR from 1256 to 1104 nm are also observed in the as-annealed samples due to the higher free carrier concentration. Meanwhile, we also demonstrated that the ITO LSPR in ITO/In-Sn NPs structures has good sensitivity to the surrounding media and stability after 30 d exposure in air, enabling its application prospects in many biosensing devices. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1361-6528/aa9abeAdditional details
Identifiers
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 29
- Journal Issue
- 1
- Journal Page Range
- [10 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 51050297
- Subject category
- S36: MATERIALS SCIENCE; S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ANNEALING; ATOMIC FORCE MICROSCOPY; CARRIERS; DEPOSITION; DOPED MATERIALS; ELECTRON BEAMS; EVAPORATION; INDIUM ALLOYS; INDIUM OXIDES; MICROSTRUCTURE; MORPHOLOGY; NANOPARTICLES; PLASMONS; RESONANCE; SEMICONDUCTOR MATERIALS; SENSITIVITY; THIN FILMS; TIN ALLOYS; TIN OXIDES; WAVELENGTHS
- Descriptors DEC
- ALLOYS; BEAMS; CHALCOGENIDES; FILMS; HEAT TREATMENTS; INDIUM COMPOUNDS; LEPTON BEAMS; MATERIALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; PARTICLE BEAMS; PARTICLES; PHASE TRANSFORMATIONS; QUASI PARTICLES; TIN COMPOUNDS