Transmission sputtering as a technique for measuring the distribution of energy deposited in solids by ion bombardment

A technique for measuring sputtering yields of thin foils has been developed. The loss of target material due to sputtering is determined by measuring the thickness change by forward scattering of 500-keV protons. By coating one surface of the target foil with a low-yield material, the transmission-sputtering and backsputtering yields can be measured separately. The technique has been applied to measure sputtering yields of 500-keV Ar+ → Au as a function of target thickness. The transmission-sputtering yield of gold is found to be lower than predicted by theory. This indicates a large influence of the surfaces. No contribution from spikes may be discerned. The variation with target thickness is in good agreement with theory, showing no evidence of long-range energy-transport mechanisms. (author)