Published July 21, 2013 | Version v1
Journal article

Three-dimensional extreme ultraviolet emission from a droplet-based laser-produced plasma

  • 1. Laboratory for Energy Conversion, ETH Zurich, 8092 Zurich (Switzerland)

Description

The emission of extreme ultraviolet radiation in a 2% bandwidth centered at 13.5 nm (in-band) is measured in one hemisphere. The targets of the laser are tin droplets. In-band emission is measured at angles from the laser axis larger than 120°. Analytical models representing the physical processes are developed and calibrated with the experimental data. In the models two assumptions are investigated, isentropic and isothermal 2D-axisymmetric expansion. The parameters of the models are the density distribution of the plasma and the location where the EUV emission is centered. The parameters are inferred by the calibration of the models with the experimental data. The predictions of the models are validated with experiments where slab targets were used

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
114
Journal Issue
3
Journal Page Range
p. 033303-033303.8
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
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