Published February 4, 2010 | Version v1
Journal article

Synthesis and characterization of nickel selenide thin films deposited by chemical method

  • 1. Department of Chemistry, Shivaji University, Kolhapur 416 004, MH (India)
  • 2. Department of Chemistry, J.S.M. College, Alibag, MH (India)
  • 3. National Chemical Laboratory, Pune, MH (India)
  • 4. Department of Chemistry, Dr. B.A.M. University, P.G. Sub-Center, Osmanabad, MH (India)

Description

Nickel selenide thin films have been deposited using chemical bath method on non-conducting glass substrates in a tartarate bath containing nickel sulphate octahydrate, hydrazine hydrate, sodium selenosulphate in an aqueous alkaline medium. The grown films were uniform, well adherent and black in color. The films were characterized using X-ray diffraction, scanning electron microscopy, optical absorption and electrical measurements. The nickel selenide thin film revealed polycrystalline nature with hexagonal system. The direct optical band gap of the film was found to be 1.61 eV. Electrical resistivity of film was observed in the order of 103 (Ω cm) with p-type conduction mechanism.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jallcom.2009.09.132

Additional details

Identifiers

DOI
10.1016/j.jallcom.2009.09.132;
PII
S0925-8388(09)01877-5;

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
490
Journal Issue
1-2
Journal Page Range
p. 228-231
ISSN
0925-8388
CODEN
JALCEU

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.