Published 2005 | Version v1
Book

Study of ion irradiation induced nickel silicide formation in Ni/Si Interface

  • 1. Surface Physics Division, Saha Institute of Nuclear Physics, Kolkata (India)

Description

This study deals with the ion irradiation induced nickel silicide formation at the interface between Ni and Si. Ni thin films of 600 A, deposited on Si(100) was irradiated by 300 keV 84Kr2+ ions with various doses and possible phase formation was examined using x-ray diffraction. The surface morphology and composition was analyzed using scanning electron microscopy and energy dispersive x-ray spectroscopy respectively. (author)

Part of:
Proceedings of the DAE solid state physics symposium. V. 49

Additional details

Publishing Information

Publisher
Prime Time Education
Imprint Place
Mumbai (India)
ISBN
81-8372-000-5
Imprint Title
Proceedings of the DAE solid state physics symposium. V. 49
Imprint Pagination
1041 p.
Journal Page Range
p. 482-483

Conference

Title
49. DAE solid state physics symposium
Dates
26-30 Dec 2004
Place
Amritsar (India)

Optional Information

Notes
3 refs., 3 figs.