Published April 1971 | Version v1
Journal article Metadata-only

Preparation of Josephson junctions by plasma oxidation of Nb

Creators

  • 1. Valtion Teknillinen Tutkimuslaitos, Helsinki (Finland)

Description

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation R. Graeffe, T. Wiik; Preparation of Josephson Junctions by Plasma Oxidation of Nb. J. Appl. Phys. 1 April 1971; 42 (5): 2146–2147. https://doi.org/10.1063/1.1660509 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAIP Publishing PortfolioJournal of Applied Physics Search Advanced Search |Citation Search

Additional details

Identifiers

DOI
10.1063/1.1660509;

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
42
Journal Issue
5
Series
J. Appl. Phys.
Journal Page Range
2146-2147
ISSN
0021-8979

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
3014558
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Progress Report, No Abstract
Descriptors DEI
CURRENTS; ELECTRIC POTENTIAL; FABRICATION; GLOW DISCHARGES; JOSEPHSON EFFECT; JUNCTIONS; LEAD; NIOBIUM; NIOBIUM OXIDES; OXIDATION; STABILITY; TIME DEPENDENCE
Descriptors DEC
ELECTRIC DISCHARGES; SEMICONDUCTORS; SUPERCONDUCTIVITY

Optional Information

Notes
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