Published April 7, 2003 | Version v1
Journal article

Nanotribology and fractal analysis of ZnO thin films using scanning probe microscopy

  • 1. Department of Mechanical Engineering, Southern Taiwan University of Technology, Tainan 710, Taiwan (China)
  • 2. Institute and Department of Electrophysics, National Chiao Tung University, Hsinchu 300, Taiwan (China)

Description

Characteristics of crystalline structure, roughness and nanotribology of ZnO thin films deposited under various power conditions were achieved by means of x-ray diffraction and scanning probe microscopy (SPM). The ZnO thin films were deposited on the silicon (100) substrates by a radio frequency magnetron sputtering system. Fractal analysis was derived from SPM images, to calculate the fractal dimension complexity of the surface geometry, via a substituting structure function. The results show that the roughness decreases and nanowear rate increases as the sputtering power increases. In addition, the fractal dimensions of the ZnO thin films are also presented

Availability note (English)

Available online at http://stacks.iop.org/0022-3727/36/878/d30717.pdf or at the Web site for the Journal of Physics. D, Applied Physics (ISSN 1361-6463) http://www.iop.org/

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
36
Journal Issue
7
Journal Page Range
p. 878-883
ISSN
0022-3727
CODEN
JPAPBE