Published April 7, 2003
| Version v1
Journal article
Nanotribology and fractal analysis of ZnO thin films using scanning probe microscopy
Creators
- 1. Department of Mechanical Engineering, Southern Taiwan University of Technology, Tainan 710, Taiwan (China)
- 2. Institute and Department of Electrophysics, National Chiao Tung University, Hsinchu 300, Taiwan (China)
Description
Characteristics of crystalline structure, roughness and nanotribology of ZnO thin films deposited under various power conditions were achieved by means of x-ray diffraction and scanning probe microscopy (SPM). The ZnO thin films were deposited on the silicon (100) substrates by a radio frequency magnetron sputtering system. Fractal analysis was derived from SPM images, to calculate the fractal dimension complexity of the surface geometry, via a substituting structure function. The results show that the roughness decreases and nanowear rate increases as the sputtering power increases. In addition, the fractal dimensions of the ZnO thin films are also presented
Availability note (English)
Available online at http://stacks.iop.org/0022-3727/36/878/d30717.pdf or at the Web site for the Journal of Physics. D, Applied Physics (ISSN 1361-6463) http://www.iop.org/Additional details
Identifiers
- URL
- http://stacks.iop.org/0022-3727/36/878/d30717.pdf; http://www.iop.org/;
- PII
- S0022-3727(03)55553-X;
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 36
- Journal Issue
- 7
- Journal Page Range
- p. 878-883
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 34052462
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CRYSTAL STRUCTURE; FRACTALS; MAGNETRONS; MICROSCOPY; NANOSTRUCTURE; ROUGHNESS; SILICON; SPUTTERING; SUBSTRATES; THIN FILMS; TRIBOLOGY; X-RAY DIFFRACTION; ZINC OXIDES
- Descriptors DEC
- CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; OXIDES; OXYGEN COMPOUNDS; SCATTERING; SEMIMETALS; SURFACE PROPERTIES; ZINC COMPOUNDS