Published June 1982 | Version v1
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Self-focusing of a pulsed electron beam in gases and their ionization

Description

A relativistic high-intensity pulsed electron beam generated from a Febetron 706 was strongly self-focused in two pressure regions, i.e., below and above 5 Torr. The dependence of the electron energy spectrum on pressure and path length in He was at first studied by measuring depth-dose distributions in an aluminum-blue cellophane stack. Then, maximum doses of the depth-dose curves in the dosimeter placed on the beam axis at 10.4 cm from the cell window were measured as functions of pressure in He, Ne, Ar, Kr, Xe, H2, D2, N2, O2, N2O, CO2, SF6, CH4, C2H2, C2H4, C2H6, C3H8, CH3F, CHClF2, CCl2F2, He + X, Ar + X, and O2 + X (X: additive gas). The strong self-focusing at pressure lower than 5 Torr is attributed to space-charge neutralization by positive ions due to escaping of secondary electrons. Therefore, relative total ionization cross sections for beam electrons could be obtained in this region. When the spa ce-charge neutralization time becomes shorter than a rise time of the pulsed beam, secondary electrons are accelerated by a backward electric field E sub(z) induced by the pulsed beam so that the self-focusing declines abruptly due to electron avalanching. The beam is self-focused again gradually with further increasing pressure because of suppression of this avalanching. The avalanching was analyzed self-consistently for He, Ar, H2, N2, and CH4 by a computer simulation in the pressure region between 5 and 300 Torr. The present computational results indicate that the larger cose is given by the longer mean ionization time t sub(i) which depends on E sub(z)/p. The value of t sub(i) increases with increasing pressure in the pressure region of gradually-increasing self-focusing. (J.P.N.)

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Additional details

Additional titles

Subtitle (English)
A novel approach to discharge chemistry

Publishing Information

Imprint Pagination
81 p.
Report number
JAERI--1278