Density Increase of Upper Quantum Dots in Dual InGaN Quantum-Dot Layers
- 1. State Key Laboratory on Integrated Optoelectronics/Tsinghua National Laboratory for Information Science and Technology, Department of Electronic Engineering, Tsinghua University, Beijing 100084 (China)
Description
Single and dual layers of InGaN quantum dots (QDs) are grown by metal organic chemical vapor deposition. In the former, the density, average height and diameter of QDs are 1.3 × 109 cm−2, 0.93nm and 65.1 nm, respectively. The latter is grown under the same conditions and possesses a 20 nm low-temperature grown GaN barrier between two layers. The density, average height and diameter of QDs in the upper layer are 2.6 × 1010 cm−2, 4.6 nm and 81.3 nm, respectively. Two reasons are proposed to explain the QD density increase in the upper layer. First, the strain accumulation in the upper layer is higher, leading to a stronger three-dimensional growth. Second, the GaN barrier beneath the upper layer is so rough it induces growth QDs. (cross-disciplinary physics and related areas of science and technology)
Availability note (English)
Available from http://dx.doi.org/10.1088/0256-307X/28/12/128101Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics Letters
- Journal Volume
- 28
- Journal Issue
- 12
- Journal Page Range
- [3 p.]
- ISSN
- 0256-307X
- CODEN
- CPLEEU
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45004107
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- BUILDUP; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; DENSITY; GALLIUM NITRIDES; INDIUM COMPOUNDS; LAYERS; ORGANOMETALLIC COMPOUNDS; QUANTUM DOTS; STRAINS; THREE-DIMENSIONAL CALCULATIONS
- Descriptors DEC
- CHEMICAL COATING; DEPOSITION; GALLIUM COMPOUNDS; NANOSTRUCTURES; NITRIDES; NITROGEN COMPOUNDS; ORGANIC COMPOUNDS; PHYSICAL PROPERTIES; PNICTIDES; SURFACE COATING