Published March 9, 2009 | Version v1
Journal article

A nanofluidic channel with embedded transverse nanoelectrodes

  • 1. School of Electrical and Computer Engineering, Purdue University, West Lafayette, IN (United States)

Description

In this paper, we demonstrate fabrication and characterization of a nanofluidic channel with embedded transverse nanoelectrodes using a combination of conventional photolithography and focused ion beam technologies. Glass-capped silicon dioxide nanochannels having 20 nm depth, 50 nm width, and 2 μm length with embedded platinum nanoelectrodes were fabricated. Channel patency was verified through measurements of the resistivity in phosphate buffered saline and electrostatic action on charged fluorescent nanospheres. Platinum nanoelectrode functionality was also tested using transverse resistance measurements in nanochannels filled with air, deionized water, and saline solution.

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/20/10/105302

Additional details

Identifiers

DOI
10.1088/0957-4484/20/10/105302;
PII
S0957-4484(09)99015-8;

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
20
Journal Issue
10
Journal Page Range
[6 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
41012739
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
FABRICATION; ION BEAMS; NANOSTRUCTURES; PHOSPHATES; PLATINUM; SILICON OXIDES
Descriptors DEC
BEAMS; CHALCOGENIDES; ELEMENTS; METALS; OXIDES; OXYGEN COMPOUNDS; PHOSPHORUS COMPOUNDS; PLATINUM METALS; SILICON COMPOUNDS; TRANSITION ELEMENTS