Published March 9, 2009
| Version v1
Journal article
A nanofluidic channel with embedded transverse nanoelectrodes
Creators
- 1. School of Electrical and Computer Engineering, Purdue University, West Lafayette, IN (United States)
Description
In this paper, we demonstrate fabrication and characterization of a nanofluidic channel with embedded transverse nanoelectrodes using a combination of conventional photolithography and focused ion beam technologies. Glass-capped silicon dioxide nanochannels having 20 nm depth, 50 nm width, and 2 μm length with embedded platinum nanoelectrodes were fabricated. Channel patency was verified through measurements of the resistivity in phosphate buffered saline and electrostatic action on charged fluorescent nanospheres. Platinum nanoelectrode functionality was also tested using transverse resistance measurements in nanochannels filled with air, deionized water, and saline solution.
Availability note (English)
Available from http://dx.doi.org/10.1088/0957-4484/20/10/105302Additional details
Identifiers
- DOI
- 10.1088/0957-4484/20/10/105302;
- PII
- S0957-4484(09)99015-8;
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 20
- Journal Issue
- 10
- Journal Page Range
- [6 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41012739
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- FABRICATION; ION BEAMS; NANOSTRUCTURES; PHOSPHATES; PLATINUM; SILICON OXIDES
- Descriptors DEC
- BEAMS; CHALCOGENIDES; ELEMENTS; METALS; OXIDES; OXYGEN COMPOUNDS; PHOSPHORUS COMPOUNDS; PLATINUM METALS; SILICON COMPOUNDS; TRANSITION ELEMENTS