Published 2012 | Version v1
Book

Electrical properties of Ag/In2O3/M (M = LaNiO3, Pt) devices for RRAM applications

  • 1. Department of Physics, School of Sciences, Gujarat University, Ahmedabad (India)
  • 2. Department of I.C., Vishwakarma Govt. Engineering College, Gandhinagar (India)
  • 3. Centre for Excellence in Nanoelectronics, Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai (India)

Description

Recent observations of room-temperature resistive switching driven by electric fields in various binary oxides such as NiO, TiO2, CuO, ZrO2 etc. and perovskite oxides such as Cr doped SrTiO3 and manganite Pr0.7Ca0.3MnO3 (PCMO) has triggered a lot of interests due to their potential use for non-volatile resistance random access memory (RRAM) applications. The latter has shown memory retention behavior exceeding 18 months. Resistance switching properties of nanostructure In2O3 films grown on Pt and LaNiO3 (LNO) bottom electrode have been investigated. Ceramic targets of LNO and In2O3 were used for pulsed laser deposition (PLD) using KrF excimer laser (e = 248 nm). LNO film (18 nm) was deposited by PLD on sonicated SiO2 substrates. In2O3 films (160 nm) were deposited on part of the conducting LNO/SiO2 as well as Pt/Ti/SiO2/Si by PLD using a metal shadow mask, to form In2O3/LNO/SiO2 and In2O3/Pt/Ti/SiO2/Si heterostructures, respectively. High purity Ag was thermally evaporated on In2O3 active layer to form top electrode. The Ag/In2O3/M (M = LNO, Pt) structure was characterized by grazing incidence XRD, AFM and cross sectional SEM. Polycrystalline growth of oxides LNO and In2O3 was confirmed by GIXRD, where as AFM show nanostructure growth with smooth surface morphology. Two terminal I-V characteristics carried out by using Kiethley 4200 PlV semiconductor characterization system, showed reproducible hysteresis suggesting two distinct resistance states in the film. Typical resistance switching ratio (Ron/Roff) of the order of 113% and 72% have been estimated for In2O3 device grown on LNO and Pt substrates, respectively. The observed resistance switching characteristics offers lot of promise for new class of binary oxide materials with oxide (LNO) as bottom electrode leading to better suitability for nanoelectronic RRAM devices. The mechanism of the observed resistance switching is analyzed by space charge limited current (SCLS) and the Schottky-like barrier formation at Ag/In2O3 interface in the off states, whereas, Pool-Frankel type conduction mechanism seems valid in the on state. Role of oxygen electro migration at the interface will also be highlighted. (author)

Part of:
Proceedings of the national symposium on advances in materials science and technology: abstract book

Additional details

Publishing Information

Publisher
Gujarat University
Imprint Place
Ahmedabad (India)
Imprint Title
Proceedings of the national symposium on advances in materials science and technology: abstract book
Imprint Pagination
102 p.
Journal Page Range
p. 42

Conference

Title
national symposium on advances in materials science and technology
Acronym
AMST 2012
Dates
3-4 Feb 2012
Place
Ahmedabad (India)

INIS

Country of Publication
India
Country of Input or Organization
India
INIS RN
44022245
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CRYSTAL DOPING; ELECTRIC CONDUCTIVITY; HYSTERESIS; INDIUM OXIDES; LANTHANUM OXIDES; NANOSTRUCTURES; X-RAY DIFFRACTION
Descriptors DEC
CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ELECTRICAL PROPERTIES; INDIUM COMPOUNDS; LANTHANUM COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RARE EARTH COMPOUNDS; SCATTERING

Optional Information

Notes
1 ref.