Published February 15, 2014
| Version v1
Journal article
Regular self-microstructuring on CR39 using high UV laser dose
- 1. Physics Department, Amirkabir University of Technology, P.O. Box 15875-4413, Tehran (Iran, Islamic Republic of)
- 2. Physics Department, Faculty of Science, Imam Khomeini International University, P.O. Box 34149-16818, Qazvin (Iran, Islamic Republic of)
- 3. Laser and Optics Research School, P.O. Box 11365-8486, Tehran (Iran, Islamic Republic of)
- 4. Mining and Metallurgical Engineering Department, Amirkabir University of Technology, P.O. Box 1591634311, Tehran (Iran, Islamic Republic of)
Description
The UV laser induced replicas in the form of self-lining microstructures are created by high dose (with high fluence) ArF laser irradiation on CR39. Microstructures as the self-induced contours, in the form of concentric circles, appear when the laser fluence is well above the ablation threshold. It leads to the regular periodic parallel lines, i.e. circles with large radii having spatial separation 100–200 nm and line width 300–600 nm, where the number of shots increases to achieve higher UV doses. The surface wettability is also investigated after laser texturing to exhibit that a notable hydrophilicity takes place at high doses.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2013.11.125Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2013.11.125;
- PII
- S0169-4332(13)02203-4;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 292
- Journal Page Range
- p. 247-255
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46005178
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ABLATION; ARGON FLUORIDES; IRRADIATION; LASER RADIATION; LINE WIDTHS; MICROSTRUCTURE; PERIODICITY; SURFACES; TEXTURE; WETTABILITY
- Descriptors DEC
- ARGON COMPOUNDS; ARGON HALIDES; ELECTROMAGNETIC RADIATION; FLUORIDES; FLUORINE COMPOUNDS; HALIDES; HALOGEN COMPOUNDS; RADIATIONS; RARE GAS COMPOUNDS; VARIATIONS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.