Impact of cathode evaporation on a free-burning arc
Creators
- 1. State Univ. of New York, Buffalo, NY (USA). Dept. of Electrical and Computer Engineering
Description
In the center of a free-burning, high intensity argon arc at atmospheric pressure, a highly ionized vapor beam of copper has been generated by a continuous feeding of a thin (0.5 and 1 mm diameter) copper wire to the hot surface region of the cathode in the vicinity of the plasma attachment. The copper vapor is carried into the plasma column between the electrodes by the self-magnetic induced plasma flow caused by the conical shape of the cathode. In order to study the vapor beam, the arc is modeled at atmospheric pressure, with a current of 150 A, a gap spacing of 1 cm, a cathode tip of 60 degrees and a copper vapor flow of 1 mg/s. The temperature, mass flow, current flow and Cu concentration are calculated for the entire plasma region. The intensity distribution of CuI spectral line at 5218.2 angstrom is also recorded by emission spectroscopy and compared with the calculated values. The copper vapor in the cathode region has velocities of 210 m/s with a mass concentration of above 90% within 0.5 mm from the arc axis. The vapor passes from the cathode toward the anode with a slight diffusion in the argon plasma. Higher temperatures and current densities in the core of the arc, caused by the cathode evaporation, are calculated
Additional details
Publishing Information
- Publisher
- IEEE Service Center.
- Imprint Place
- Piscataway, NJ (USA)
- Imprint Title
- 1990 IEEE international conference on plasma science-Conference Record-Abstracts
- Imprint Pagination
- 231 p.
- Journal Page Range
- p. 201.
Conference
- Title
- 17. IEEE international conference on plasma science (ICOPS 17).
- Dates
- 21-23 May 1990.
- Place
- Oakland, CA (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 22057166
- Subject category
- S74: ATOMIC AND MOLECULAR PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ARGON; CATHODES; COPPER; COPPER IODIDES; COPPER IONS; ELECTRIC ARCS; EMISSION SPECTRA; EVAPORATION; ION BEAMS; ION SOURCES; MASS TRANSFER; PLASMA DRIFT; VAPORS; WIRES
- Descriptors DEC
- ATOMIC IONS; BEAMS; CHARGED PARTICLES; COPPER COMPOUNDS; COPPER HALIDES; CURRENTS; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRODES; ELEMENTS; FLUIDS; GASES; HALIDES; HALOGEN COMPOUNDS; IODIDES; IODINE COMPOUNDS; IONS; METALS; NONMETALS; PHASE TRANSFORMATIONS; RARE GASES; SPECTRA; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS
Optional Information
- Secondary number(s)
- CONF-900585--.