Published 1990 | Version v1
Book

Impact of cathode evaporation on a free-burning arc

Creators

  • 1. State Univ. of New York, Buffalo, NY (USA). Dept. of Electrical and Computer Engineering

Description

In the center of a free-burning, high intensity argon arc at atmospheric pressure, a highly ionized vapor beam of copper has been generated by a continuous feeding of a thin (0.5 and 1 mm diameter) copper wire to the hot surface region of the cathode in the vicinity of the plasma attachment. The copper vapor is carried into the plasma column between the electrodes by the self-magnetic induced plasma flow caused by the conical shape of the cathode. In order to study the vapor beam, the arc is modeled at atmospheric pressure, with a current of 150 A, a gap spacing of 1 cm, a cathode tip of 60 degrees and a copper vapor flow of 1 mg/s. The temperature, mass flow, current flow and Cu concentration are calculated for the entire plasma region. The intensity distribution of CuI spectral line at 5218.2 angstrom is also recorded by emission spectroscopy and compared with the calculated values. The copper vapor in the cathode region has velocities of 210 m/s with a mass concentration of above 90% within 0.5 mm from the arc axis. The vapor passes from the cathode toward the anode with a slight diffusion in the argon plasma. Higher temperatures and current densities in the core of the arc, caused by the cathode evaporation, are calculated

Additional details

Publishing Information

Publisher
IEEE Service Center.
Imprint Place
Piscataway, NJ (USA)
Imprint Title
1990 IEEE international conference on plasma science-Conference Record-Abstracts
Imprint Pagination
231 p.
Journal Page Range
p. 201.

Conference

Title
17. IEEE international conference on plasma science (ICOPS 17).
Dates
21-23 May 1990.
Place
Oakland, CA (USA).

Optional Information

Secondary number(s)
CONF-900585--.