Published June 1997 | Version v1
Journal article

The effective dissipation in Nb/AlOx/Nb Josephson tunnel junctions by return current measurements

  • 1. INFN sez. Napoli, Naples (Italy)
  • 2. Istituto di Cibernetica del CNR, Arco Felice, Naples (Italy)
  • 3. INFN sez. Roma, Rome (Italy)
  • 4. Istituto di Elettronica dello Stato Solido del CNR, Rome (Italy)
  • 5. Universita di Roma La Sapienza, Rome (Italy)

Description

Measurements of temperature dependence of the return current in high quality Nb/AlOx/Nb Josephson junctions are presented. From the experimental data, we obtain the effective resistance, i.e., the effective dissipation, for the retrapping process, according to the generalized resistively shunted junction model proposed by Chen, Fisher, and Leggett. We present a careful analysis, based on a comparison between the measured temperature dependencies of both the return and the quasiparticle tunneling current. We find that the junction subgap conductance, which includes the quasiparticle and the quasiparticle-pair interference terms, is responsible for the return process. The measurements have been performed on various samples, in a wide range of critical current densities from 50 to 2250A/cm2, covering different damping regimes and spanning over the high and low temperature limits. Junctions with low critical current density show ideal dissipation which makes the return current scale with temperature according to the BCS exponential behavior without flattening out effects. This result may be relevant for the possible use of Nb/AlOx/Nb junctions in macroscopic quantum coherence experiments, which strongly require a very low dissipation. copyright 1997 American Institute of Physics

Additional details

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
81
Journal Issue
11
Journal Page Range
p. 7418-7426.
ISSN
0021-8979
CODEN
JAPIAU