Published May 15, 2011
| Version v1
Journal article
Layer-by-layer deposition of Ti-4,4'-oxydianiline hybrid thin films
- 1. Laboratory of Inorganic Chemistry, Department of Chemistry, Aalto University, FI-00076 Aalto (Finland)
Description
Features of the two thin-film techniques, atomic layer deposition (ALD) and molecular layer deposition (MLD), are combined to build up a stable novel inorganic-organic hybrid material of the (-Ti-N-C6H4-O-C6H4-N-)n type, deposited from successive pulses of TiCl4 and 4,4'-oxydianiline precursors. Depositions in the temperature range of 160-230 deg. C resulted in unstable films, while the films obtained in the temperature range of 250-490 deg. C were found stable in atmospheric air. The growth rate increased with increasing temperature, from 0.3 A per cycle at 160 deg. C to 1.1 A per cycle at 490 deg. C.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2011.02.022Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2011.02.022;
- PII
- S0169-4332(11)00213-3;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 257
- Journal Issue
- 15
- Journal Page Range
- p. 6435-6439
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44024618
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- AIR; DEPOSITION; LAYERS; ORGANIC COMPOUNDS; PULSES; TEMPERATURE RANGE 0400-1000 K; THIN FILMS; TITANIUM CHLORIDES
- Descriptors DEC
- CHLORIDES; CHLORINE COMPOUNDS; FILMS; FLUIDS; GASES; HALIDES; HALOGEN COMPOUNDS; TEMPERATURE RANGE; TITANIUM COMPOUNDS; TITANIUM HALIDES; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.