Formation of the silicon coating on the NiTi substrate by magnetron sputtering

The paper studies the regularities of silicon coatings formation on a substrate of an alloy based on nickel titanium using the radio-frequency (RF) magnetron sputtering method. It is shown that the use of the RF magnetron sputtering method allows making a silicon coating with a thickness more than 6 μm. It is determined that treatment time has the main influence on the thickness of a coating. The magnitude of the RF-power level of magnetron sputtering has a smaller effect on the thickness of the emerging coating. (paper)