Published June 2000 | Version v1
Journal article

Atomic control of substrate termination and heteroepitaxial growth of SrTiO3/LaAlO3 films

  • 1. Seoul National Univ., Seoul (Korea, Republic of)
  • 2. Pohang University of Science and Technology, Pohang (Korea, Republic of)

Description

The roles of substrate termination in the growth behaviors of SrTiO3 (STO) films were investigated. With heat treatment and an atomic layer deposition technique, LaAlO3 (LAO) substrates with two kinds of terminations, i.e., LaO- and AlO2-terminated ones, could be prepared. On top of them STO films were grown by using laser molecular beam epitaxy. In the case of the STO/LaO-LAO film, a transition from layer-by-layer growth to island growth was observed after growth of about 10 monolayers (ML). On the other hand, the STO/AlO2-LAO film could be grown in a layer-by-layer mode with a flat surface up to 40 ML. We suggest that defects induced by charge compensation influence the strain states and the physical properties of oxide heterostructures significantly

Additional details

Publishing Information

Journal Title
Journal of the Korean Physical Society
Journal Volume
36
Journal Issue
6
Series
21 refs, 6 figs
Journal Page Range
p. 444-448
ISSN
0374-4884