Published November 3, 2008 | Version v1
Journal article

Structural investigation of the LaAlO3(110) surface

  • 1. Laboratoire de Physique et de Spectroscopie Electronique, UMR 7014 CNRS-UHA, Faculte des Sciences et Techniques, 4 rue des Freres Lumiere, 68093 MULHOUSE Cedex (France)

Description

Chemical and structural characterizations of the LaAlO3(110) surface was investigated by XPS, XPD, LEED and RHEED. The atomic structure of this ternary alloy, can be viewed as a superposition of LaO and AlO2 planes in the [001] direction. For clean substrates, a c(4 x 2) surface reconstruction was pointed out by RHEED and LEED. Polar X-ray photoelectron diffraction investigations made in the [- 110] azimuthal direction, for La3d, O1s and Al2score levels reveal well structured diagrams reflecting the atomic distribution of the two kinds of parallel planes in the [- 110] direction and perpendicular to the (110) surface. The main crystallographic directions give strong forward-scattering peaks at 0o, 35o and 54.7o corresponding to the [110], [111] and [112] directions respectively

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2008.08.140

Additional details

Identifiers

DOI
10.1016/j.tsf.2008.08.140;
PII
S0040-6090(08)00916-4;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
517
Journal Issue
1
Journal Page Range
p. 441-443
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
5. International conference on silicon epitaxy and heterostructures
Acronym
ICSI-5
Dates
20-24 May 2007
Place
Marseille (France)

Optional Information

Copyright
Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.