Published 1990 | Version v1
Book

The study of the affects of X-ray and electron-beam radiation on poly(4-t-butoxycarbonyloxystyrene-sulfone)

  • 1. AT and T Bell Labs., Murray Hill, NJ (United States)

Description

The two component system consisting of poly(4-t-butoxycarbonyloxystyrene-sulfone) (TBSS) and an acid generating species (AGS) has been shown to function as a deep-UV resist. However, unlike what is observed with deep-UV radiation TBSS, in the absence of the AGS, is found to function as an X-ray and/or electron-beam chemically amplified resist. The degree of amplification is shown to be a function of the composition of the polymer (ratio of sulfur dioxide to t-boc-oxy-styrene). A radiation induced thermally assisted reaction mechanism describing the self conversion of TBSS to poly(4-hydroxystyrene-sulfone) is presented

Additional details

Publishing Information

Publisher
American Chemical Society.
Imprint Place
Washington, DC (United States)
Imprint Title
American Chemical Society. Division of Polymer Chemistry, Inc.
Imprint Pagination
124 p.
Journal Page Range
p. 113, Paper POLY 355.

Conference

Title
200. American Chemical Society (ACS) national meeting.
Dates
26-31 Aug 1990.
Place
Washington, DC (United States).

Optional Information

Secondary number(s)
CONF-900802--.