Published June 2, 2008
| Version v1
Journal article
Gasless sputtering: Opportunities for ultraclean metallization, coatings in space, and propulsion
Creators
- 1. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States)
Description
Pulsed magnetron sputtering was demonstrated in high vacuum: no sputter gas was used at any time. Sustained self-sputtering was initiated by multiply charged ions from a short vacuum arc. Copper ion currents to an ion collector in excess of 30 A were measured, implying a plasma density of about 6x1018 m-3. This technology may prove useful for metal coatings free of noble gas inclusions and suggests that magnetrons could operate in the vacuum of space. In addition to coating objects in space, the momentum of the sputtered atoms and ions may be utilized in space thrusters
Additional details
Identifiers
- DOI
- 10.1063/1.2938414;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 92
- Journal Issue
- 22
- Journal Page Range
- p. 221503-221503.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40003291
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S36: MATERIALS SCIENCE;
- Descriptors DEI
- COATINGS; COPPER IONS; DEPOSITION; ION THRUSTERS; MAGNETRONS; PLASMA DENSITY; PROPULSION; RARE GASES; SPUTTERING; THIN FILMS
- Descriptors DEC
- CHARGED PARTICLES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; FLUIDS; GASES; IONS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NONMETALS; THRUSTERS
Optional Information
- Notes
- (c) 2008 American Institute of Physics