Published 1981 | Version v1
Book

The identification of atomic defect chain configurations in ion irradiated Si by high resolution electron microscopy

  • 1. IBM Watson Research Center, Yorktown Heights, NY (USA)

Description

In a high resolution electron microscope lattice imaging study of As+ ion damaged Si, <110> vacancy and interstitial chain type defects have been detected. The presence has also been observed of intermediate defect configurations (IDC's) consisting of 5-7 membered Si ring structures such as a 900 edge dislocation dipole and a more extended (113) stacking fault configuration. By image matching of experimental and calculated electron micrographs obtained from multislice dynamical diffraction calculations the optimum criteria for detecting atomic defect chains under axial illumination have been established. A dislocation dipole and other IDC chains in Si are identified because of lattice distortion where an inclined electron beam gives the most reliable image information transfer. (author)

Additional details

Publishing Information

Publisher
Institute of Physics.
Imprint Place
Bristol
ISBN
0 85498 151 9
Imprint Title
Microscopy of semiconducting materials, 1981
Imprint Pagination
464 p.
Journal Page Range
p. 23-28.

Conference

Title
Microscopy of semiconducting materials conference.
Dates
5 - 10 Apr 1981.
Place
Oxford, UK.