Published March 5, 2010 | Version v1
Journal article Metadata-only

Initial stages of few-layer graphene growth by microwave plasma-enhanced chemical vapour deposition

Creators

  • 1. VITO Materials, Flemish Institute for Technological Research, Boeretang 200, BE-2400 Mol (Belgium)
  • 2. Department of Materials Science and Engineering, Ghent University, Technologiepark 903, BE-9052 Ghent (Belgium)
  • 3. Laboratory of Solid-State Physics and Magnetism, Katholieke Universiteit Leuven, Celestijnenlaan 200D, BE-3001 Leuven (Belgium)

Description

A promising method for the production of few-layer graphene (FLG) is microwave plasma-enhanced chemical vapour deposition (MW PECVD). However, the growth mechanism of PECVD-synthesized FLG is not completely understood. The aim of this work was to investigate the initial stages of the growth process of FLG deposited by MW PECVD on several substrates (quartz, silicon, platinum). The deposited thin films were characterized by angle-resolved x-ray photoelectron spectroscopy (ARXPS), electron backscattered diffraction (EBSD), scanning electron microscopy (SEM) and x-ray diffraction (XRD). It was found that the initial stages of the deposition were different for the three chosen substrate materials. However, the fully grown FLG layers were similar for all substrates.

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/21/9/095602

Additional details

Identifiers

DOI
10.1088/0957-4484/21/9/095602;
PII
S0957-4484(10)39456-6;

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
21
Journal Issue
9
Journal Page Range
[7 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43022203
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
BACKSCATTERING; CHEMICAL VAPOR DEPOSITION; ELECTRON DIFFRACTION; ELECTRONS; GROWTH; LAYERS; MATERIALS; MICROWAVE RADIATION; PLATINUM; QUARTZ; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; THIN FILMS; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY
Descriptors DEC
CHEMICAL COATING; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELEMENTARY PARTICLES; ELEMENTS; FERMIONS; FILMS; LEPTONS; METALS; MICROSCOPY; MINERALS; OXIDE MINERALS; PHOTOELECTRON SPECTROSCOPY; PLATINUM METALS; RADIATIONS; SCATTERING; SEMIMETALS; SPECTROSCOPY; SURFACE COATING; TRANSITION ELEMENTS