Published May 1, 1982 | Version v1
Journal article

Neutron transmutation doped silicon detectors

  • 1. Korea Univ., Tokyo (Japan). Dept. of Electronics Engineering
  • 2. Brookhaven National Lab., Upton, NY (USA)
  • 3. Komatsu Electronic Metals Co., Hiratsuka (Japan)
  • 4. Tokyo Univ., Tanashi (Japan). Inst. for Nuclear Study
  • 5. Rikkyo Univ., Yokosuka, Kanagawa (Japan). Inst. for Atomic Energy

Description

High resistivity n-type silicons has been produced from ultra-high purity p-type silicon by neutron transmutation doping. The material produced by this method has better dopant homogeneity and controllability than carefully produced floating zone crystals. The characteristics of a variation of detectors made from this material are equivalent to those of the conventional silicon detectors. (orig.)

Additional details

Publishing Information

Journal Title
Nucl. Instrum. Methods Phys. Res.
Journal Volume
196
Journal Issue
1
Series
Nucl. Instrum. Methods Phys. Res.
Journal Page Range
143-148
ISSN
0029-554X

Conference

Title
INS international symposium on nuclear radiation detectors.
Dates
23 - 26 Mar 1981.
Place
Tokyo, Japan.