Published October 2018 | Version v1
Journal article

Interlayer electrical resistivity of rotated graphene layers studied by in-situ scanning electron microscopy

  • 1. Key Laboratory for the Physics and Chemistry of Nanodevices and Department of Electronics, Peking University, Beijing 100871 (China)

Description

Highlights: • An in-situ SEM method is developed for studying interlayer electrical transport between rotated 2D materials. • Interlayer electrical transport between rotated graphene is studied. • Interlayer resistivity of rotated graphene increases by 3 orders of magnitude with rotation angle increase. - Abstract: Interlayer electrical transport between two-dimensional atomic crystals can be strongly modulated by the rotational misalignment between them. However, the experimental study on the interlayer electrical transport between rotated two-dimensional atomic crystals with variable rotation angles is challenging. Here, an in-situ scanning electron microscopy method is developed to study the interlayer electrical transport between rotated graphene layers. We employ nanoprobes installed in a scanning electron microscope to function as both "fingers" to induce interlayer rotation of a microfabricated metal-graphite-metal sandwiched island and also electrical probes to measure interlayer electrical resistivity of the rotated graphene layers. Interlayer electrical resistivity of the rotated graphene layers is found to increase monotonically by three orders of magnitude from ∼0.1 to ∼100 Ω cm when the rotational misalignment angle increases from 0° to 30°. This phenomenon can be well described by phonon-mediated electrical transport model. The large-magnitude tunability of interlayer electrical resistivity by mechanical rotation implies the potential applications of rotated graphene layers in nanoelectromechanical systems. Our results also provide a method for studying and tuning interlayer electrical transport between rotated two-dimensional atomic crystals.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.ultramic.2018.06.015

Additional details

Identifiers

DOI
10.1016/j.ultramic.2018.06.015;
PII
S0304399118300214;

Publishing Information

Journal Title
Ultramicroscopy (Amsterdam)
Journal Volume
193
Journal Page Range
p. 90-96
ISSN
0304-3991
CODEN
ULTRD6

INIS

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.