Published January 24, 2011
| Version v1
Journal article
Watching bismuth nanowires grow
Creators
- 1. Department of Materials Science and Engineering, Yonsei University, 134 Shinchon, Seoul 120-749 (Korea, Republic of)
- 2. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 (United States)
- 3. Department of Materials Science and Engineering, Seoul National University, Seoul 151-744 (Korea, Republic of)
Description
We report real-time high temperature scanning electron microscopy observations of the growth of bismuth nanowires via the on-film formation of nanowires (OFF-ON) method. These observations provide experimental evidence that thermally induced-stress on a Bi film is the driving force for the growth of Bi nanowires with high aspect ratios, uniform diameter, and high-quality crystallinity. Our results show that immobile grain boundaries in the Bi film are required for the growth of nanowires so that grain broadening resulting in hillock formation can be prevented. This study not only provides an understanding of the underlying mechanism, but also affords a strategy for facilitating nanowire growth by OFF-ON.
Additional details
Identifiers
- DOI
- 10.1063/1.3535956;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 98
- Journal Issue
- 4
- Journal Page Range
- p. 043102-043102.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42108910
- Subject category
- S36: MATERIALS SCIENCE; S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ASPECT RATIO; BISMUTH; FABRICATION; GRAIN BOUNDARIES; QUANTUM WIRES; SCANNING ELECTRON MICROSCOPY; STRESSES; THIN FILMS
- Descriptors DEC
- DIMENSIONLESS NUMBERS; ELECTRON MICROSCOPY; ELEMENTS; FILMS; METALS; MICROSCOPY; MICROSTRUCTURE; NANOSTRUCTURES
Optional Information
- Notes
- (c) 2011 American Institute of Physics