Published January 24, 2011 | Version v1
Journal article

Watching bismuth nanowires grow

  • 1. Department of Materials Science and Engineering, Yonsei University, 134 Shinchon, Seoul 120-749 (Korea, Republic of)
  • 2. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 (United States)
  • 3. Department of Materials Science and Engineering, Seoul National University, Seoul 151-744 (Korea, Republic of)

Description

We report real-time high temperature scanning electron microscopy observations of the growth of bismuth nanowires via the on-film formation of nanowires (OFF-ON) method. These observations provide experimental evidence that thermally induced-stress on a Bi film is the driving force for the growth of Bi nanowires with high aspect ratios, uniform diameter, and high-quality crystallinity. Our results show that immobile grain boundaries in the Bi film are required for the growth of nanowires so that grain broadening resulting in hillock formation can be prevented. This study not only provides an understanding of the underlying mechanism, but also affords a strategy for facilitating nanowire growth by OFF-ON.

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
98
Journal Issue
4
Journal Page Range
p. 043102-043102.3
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
42108910
Subject category
S36: MATERIALS SCIENCE; S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
ASPECT RATIO; BISMUTH; FABRICATION; GRAIN BOUNDARIES; QUANTUM WIRES; SCANNING ELECTRON MICROSCOPY; STRESSES; THIN FILMS
Descriptors DEC
DIMENSIONLESS NUMBERS; ELECTRON MICROSCOPY; ELEMENTS; FILMS; METALS; MICROSCOPY; MICROSTRUCTURE; NANOSTRUCTURES

Optional Information

Notes
(c) 2011 American Institute of Physics