Published 1989 | Version v1
Book

Investigation of Ga diffusion in (001) and (111) CdTe layers grown on (001) GaAs

  • 1. Lab for Microstructural Sciences, NRCC, 100 Sussex Dr., Ottawa, Ont, K1A 0R6 (Canada)
  • 2. Metals Technology Lab, CANMET, 568 Booth St., Ottawa, Ont, K1A 0G1 (Canada)
  • 3. Francis Bitter National Magnet Lab, MIT, Cambridge, MA (USA)

Description

A secondary ion mass spectroscopy study of Ga diffusion in CdTe grown on (001) GaAs is reported. The layers were grown by pulsed laser evaporation and epitaxy. Two characteristic regions with increased Ga concentration were found. The first was the CdTe/GaAs interface where the concentration of Ga decreases rapidly to the detection limit of ∼ 8 x 10 14 cm -3. This region was usually less than 300 nm wide. The second was a surface region with a Ga accumulation of up to ∼ 10 17 cm -3 lon imaging revealed that in the (001) CdTe layers, Ga accumulates near the surface at localized spots, up to about 8 μ in diameter. This feature is less apparent in the (111) CdTe layers. Annealing at 500 degrees C for 1 h increased the Ga concentration in the whole layer to above 10 16 cm -3. The authors also observe thermal annealing induced precipitation of Ga at the surface of bulk CdTe samples which were originally uniformly doped with Ga

Additional details

Publishing Information

Publisher
Materials Research Society.
Imprint Place
Pittsburgh, PA (USA)
ISBN
1-55899-004-6
Imprint Title
Chemical perspectives of microelectronic materials
Imprint Pagination
642 p.
Series
Materials Research Society symposium proceedings. Volume 131.
Journal Page Range
p. 143-148.

Conference

Title
Chemical perspectives of microelectronic materials.
Dates
30 Nov - 2 Dec 1988.
Place
Boston, MA (USA).

Optional Information

Secondary number(s)
CONF-8811223--.